台式石英管炉ATV Techologie GmbH
PEO 601
台式石英管炉
ATV Techologie GmbH
PEO 601
EXW 固定价格 不含增值税
€6,500
出厂年份
2007
状况
二手
位置
Dresden 

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价格和位置
EXW 固定价格 不含增值税
€6,500
- 位置:
- Heilbronner Str. 22, 01189 Dresden, Deutschland

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优惠详情
- 广告编号:
- A19629521
- 参考编号:
- LW42193
- 更新:
- 最近更新时间为 23.07.2025
描述
ATV Technologie GmbH Tabletop Quartz Tube Furnace, PEO 601
Model: PEO601
Condition: Used
Technical Data:
230/400V AC
50Hz
16A
6.3kW
20-1000°C
General Information:
Year of manufacture: 2007
Serial number: 172
Operating hours: 6,383
Compact tabletop unit for Plasma Electrolytic Oxidation (PEO) or Micro Arc Oxidation (MAO)
Equipment for firing or annealing electronic components
Designed for surface treatment processes of aluminum, magnesium, and titanium
Produces ceramic coatings on metal surfaces that are particularly hard, corrosion-resistant, and temperature-resistant
Programmable firing furnace with precise temperature control
Csdpjw Dbrvofx Ahvepw
Maximum temperature range: up to approx. 1,000°C
Heating rate: approx. 100°C/min
Processing chamber: diameter approx. 112 mm (4½″), suitable for wafers up to 100 mm
Application in semiconductor, micro, and nanosystem technology
Ideal for research, development, and small series production
Microprocessor-based control with adjustable parameters (e.g., voltage, current, time)
Integrated control panel with digital displays
RS-232 interface for process data monitoring and control
Optional connection for process gases (e.g., N₂, H₂)
Accessories:
Scope of delivery as shown in the photos
该广告为自动翻译,可能存在翻译错误。
Model: PEO601
Condition: Used
Technical Data:
230/400V AC
50Hz
16A
6.3kW
20-1000°C
General Information:
Year of manufacture: 2007
Serial number: 172
Operating hours: 6,383
Compact tabletop unit for Plasma Electrolytic Oxidation (PEO) or Micro Arc Oxidation (MAO)
Equipment for firing or annealing electronic components
Designed for surface treatment processes of aluminum, magnesium, and titanium
Produces ceramic coatings on metal surfaces that are particularly hard, corrosion-resistant, and temperature-resistant
Programmable firing furnace with precise temperature control
Csdpjw Dbrvofx Ahvepw
Maximum temperature range: up to approx. 1,000°C
Heating rate: approx. 100°C/min
Processing chamber: diameter approx. 112 mm (4½″), suitable for wafers up to 100 mm
Application in semiconductor, micro, and nanosystem technology
Ideal for research, development, and small series production
Microprocessor-based control with adjustable parameters (e.g., voltage, current, time)
Integrated control panel with digital displays
RS-232 interface for process data monitoring and control
Optional connection for process gases (e.g., N₂, H₂)
Accessories:
Scope of delivery as shown in the photos
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